BAY AREA AIR QUALITY MANAGEMENT DISTRICT
Best Available Control Technology (BACT) Guideline

Source Category

Source: Semiconductor Fabrication - Photoresist Operations Revision: 2
Document #: 149A.1.1
Class: All Date: 06/16/95

Determination

POLLUTANT

 BACT
1. Technologically Feasible/ Cost Effective
2. Achieved in Practice		 TYPICAL TECHNOLOGY
POC 1.  n/d
2.  Enclosure of photoresist track and spinner, and vent to abatement system w/ destruction/recovery efficiency >98.5% or VOC outlet concentration <10 ppmva,b,T		 1.  n/d
2.  BAAQMD approved Collection System and Abatement Devicea,b,T
NOx 1. n/a
2.  n/a		 1.  n/a
2. n/a
SO2 1. n/a
2.  n/a		 1.  n/a
2. n/a
CO 1. n/a
2.  n/a		 1.  n/a
2. n/a
PM10 1. n/a
2.  n/a		 1.  n/a
2. n/a
NPOC 1.  n/d
2.  Same as for POC abovea,b,T		 1.  n/d
2.  BAAQMD approved Collection system and Abatement Devicea,b,T

References

a. BAAQMD A #6266
b. For abatement device, the following are acceptable:  <10 ppmv at outlet; or >98.5% destruction/recovery efficiency if inlet VOC >2000 ppmv: or >97% efficiency if inlet VOC >200 to <2000 ppmv; or >90% efficiency if inlet VOC <200 ppmv.
T. TBACT